How do the Inpaint Crop and Stitch nodes work, which parameters control context and resolution, and what do they guarantee about unmasked pixels?
Problem. Inpainting only a masked region quickly, at a model-friendly resolution, without touching the rest of the image. Conditions. lquesada/ComfyUI-Inpaint-CropAndStitch, commit 6005efc0 (pushed 2026-10-21), version 3.0.20, GPL-3.0; no extra requirements file. Method. Inpaint Crop cuts around the mask (optionally with a wider context area), can pre-resize, extend for outpainting, fill mask holes, grow or blur the mask; output goes to any sampler workflow (even upscaled or hi-res fixed), then Inpaint Stitch pastes the result back. Key parameters: context_from_mask_extend_factor (1 = no growth, 2 = grow by mask size each direction), output_resize_to_target_size (force e.g. 1024x1024 for SDXL), output_padding (make width/height multiples of 8/16/32), mask_blend_pixels (grow and blur the stitch mask to avoid seams), mask_hipass_filter (ignore near-zero mask values), device_mode (cpu or gpu). The README states the unmasked part is not modified, not even passed through VAE encode/decod...
Structured fields
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"citations": [
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"url": "https://raw.githubusercontent.com/lquesada/ComfyUI-Inpaint-CropAndStitch/6005efc02f7745649118edd89cdd084c2b9bd3ae/README.md",
"note": "Overview; Parameters; Overview"
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- [sourced_fact] Problem. Inpainting only a masked region quickly, at a model-friendly resolution, without touching the rest of the image. Conditions. lquesada/ComfyUI-Inpaint-CropAndStitch, commit 6005efc0 (pushed 2026-10-21), version 3.0.20, GPL-3.0; no extra requirements file. Method. Inpaint Crop cuts around the mask (optionally with a wider context area), can pre-resize, extend for outpainting, fill mask holes, grow or blur the mask; output goes to any sampler workflow (even upscaled or hi-res fixed), then Inpaint Stitch pastes the result back. Key parameters: context_from_mask_extend_factor (1 = no growth, 2 = grow by mask size each direction), output_resize_to_target_size (force e.g. 1024x1024 for SDXL), output_padding (make width/height multiples of 8/16/32), mask_blend_pixels (grow and blur the stitch mask to avoid seams), mask_hipass_filter (ignore near-zero mask values), device_mode (cpu or gpu). The README states the unmasked part is not modified, not even passed through VAE encode/decode, and offers SD1.5, Flux (GGUF plus an inpainting ControlNet) and large-resolution example workflows. Failure modes. Mask values near zero counted as masked; models needing dimension multiples when output_padding is wrong; keeping aspect ratio is required when rescaling the cropped image with an upscale model. Limitations. README claims; not tested. Tutorial video is for an earlier node version. Version and date. Commit 6005efc0. · locator: Overview; Parameters; Overview source
Rights
| component | license | hosting | redistribution | modification | training | Evidence and notes |
|---|---|---|---|---|---|---|
| documentation | unknown | permitted | permitted | unknown | unknown | Applies to this original summary only, not to the cited sources. |